Title: Substrate cleaning system and substrate cleaning method
Application Number: 200610100040 Application Date: 2006.06.27
Publication Number: 1891358 Publication Date: 2007.01.10
Approval Pub. Date: Granted Pub. Date:
International Classifi-cation: B08B3/10;B08B3/00
Applicant(s) Name: Shimada Rika Kogyo KK Address:
Inventor(s) Name: Hagiwara Takehiro;Kataoka Tatsuo;Noda Seiji;Nakai
Attorney & Agent: wen dapeng
Abstract:
    A substrate cleaning system that cleans a glass substrate by supplying liquid and gas to spray nozzles and by spraying fluid, where the liquid and the gas are mixed in the spray nozzles, onto the substrate in order to effectively remove foreign objects attached on the end surface of substrate after performing mechanical cut-off or polishing treatment, the system has: liquid heating means for heating the liquid to be supplied to the spray nozzles to control the temperature of the liquid, in which the temperature of the liquid at the inlet of the spray nozzles is controlled at 40 DEG C. to 100 DEG C.
Time: 22
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