Title: Process of preparing single-layer nanometer TiO2 rod film in pure rutile structure
Application Number: 200610052743 Application Date: 2006.08.01
Publication Number: 1888135 Publication Date: 2007.01.03
Approval Pub. Date: Granted Pub. Date:
International Classifi-cation: C23C22/05;C23G1/10;C23G5/00;B08B3/12
Applicant(s) Name: Zhenjiang Univ. Address:
Inventor(s) Name: Wu Jinming
Attorney & Agent: han gemei
Abstract:
    The preparation process of single-layer nanometer TiO2 rod film in pure rutile structure includes the following steps: mixing hydrofluoric acid, nitric acid and deionized water to compound acid pickling solution; adding nitric acid and hexamethylenetetramine to obtain reactant solution A; pickling metal titanium plate with the acid pickling solution, soaking the pickled metal titanium plate inside the reactant solution A for reaction at 60-80 deg.c of 24-60 hr to obtain reactant solution B after taking out the plate; pickling one other metal titanium plate, soaking the pickled metal titanium plate inside hydrogen peroxide solution for reaction at 60-80 deg.c of 5-15 min, taking out the plate and washing with deionized water to obtain titanium base plate; soaking the titanium base plate inside the reactant solution B for reaction at 60-80 deg.c over 12 hr, washing the reacted titanium base plate with deionized water and drying to obtain the nanometer TiO2 rod film.
Time: 22
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