Title: Substrate treating apparatus
Application Number: 200610125768 Application Date: 2006.08.28
Publication Number: 1947871 Publication Date: 2007.04.18
Approval Pub. Date: Granted Pub. Date:
International Classifi-cation: B08B7/00;B08B7/04;B08B1/02;B08B3/02;F26B5/00
Applicant(s) Name: Dainippon Screen Mfg Address:
Inventor(s) Name: Yamamoto Satoshi;Matsumoto Takao
Attorney & Agent: xushu
Abstract:
    A substrate treating apparatus, includes an ultraviolet irradiation part for irradiating the substrate (B); a wiper mechanism, arranged adjoin with the ultraviolet irradiation part and arranging a plurality of liquid treating apparatuses adjacently to process the substrate (B); a substrate transfer mechanism having a mobile path from the ultraviolet irradiation part to the brush treating part of the wiper mechanism, twin fluid atomization providing part, and a brush part; an air curtain forming nozzle, formed into the air curtain separating the space between the ultraviolet irradiation part and the wiper mechanism having the mobile path into the ultraviolet irradiation part side and the wiper mechanism side; a fluid curtain forming nozzle, formed into the fluid curtain separating the space between the adjoining brush treating part, the twin fluid atomization providing part, the brush part with at least one mobile path into the upstream side and the downstream side in the substrate moving direction. The invention can reduce the cost and improve the closing effect.
Time: 11
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