Title: Substrate drying device and method, and substrate producing method
Application Number: 200610152390 Application Date: 2006.09.28
Publication Number: 1941282 Publication Date: 2007.04.04
Approval Pub. Date: Granted Pub. Date:
International Classifi-cation: H01L21/00;H01L21/30;F26B7/00;B08B3/00
Applicant(s) Name: Hitachi High Tech. Corp. Address:
Inventor(s) Name:
Attorney & Agent: shouning zhanghua hui
Abstract:
    The present invention can move substrates with high speed, at the same time equably dry substrates. Nozzle (21) supplies cleaning liquid to the surface of the substrate 1, air knives (22a, 22b) eject air to the surface of back of the substrate (1). The air ejected from air knife (22a) makes the cleaning liquid supplied by nozzle (21) move toward the opposite direction of the substrate moving direction on the substrate (1). Adjusting the quantity of the cleaning liquid supplied by nozzle (21) and the quantity and speed of the air ejected from air knife (22a) in order to make the cleaning liquid moving speed slower than the substrate moving speed. Therefore, forming the continuous and thin liquid film of cleaning liquid on the whole surface of the substrate (1) under the air knife (22a). The liquid film forming on the surface of the substrate (1) is vaporized when it through the lower part of the halogen lamp (31), and is wiped off from one end of the substrate (1) continuously.
Time: 14
<- Previous Patent:Substrate transfer apparatus   |  Next Patent:Steel wire rust cleaning method a... ->