Title: Acid-free cleaning process for substrates, in particular masks and mask blanks
Application Number: 200610152856 Application Date: 2006.10.20
Publication Number: 1958177 Publication Date: 2007.05.09
Approval Pub. Date: Granted Pub. Date:
International Classifi-cation: B08B3/00;B08B3/12;B08B3/02;B08B3/08;F26B5/08;G03F1/00;G03F7/26
Applicant(s) Name: Schott AG Address:
Inventor(s) Name: Harald Koster;Dr. Henryson O. Omoregie Sr Eit
Attorney & Agent: wangyuan fang liuguo wei
Abstract:
    The invention relates to a novel and advantageous method for cleaning substrate, in particular masks or mask substrate. The method provided in this invention is characterized in that providing a continuous process which includes UV processing, fulljet cleaning, mega-sonic cleaning and DI (De-ionized) water cleaning. Acid cleaning process and utilizing a special alkali detergent composition is not included in present invention.
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