Title: Cleanout method of metal deposited on surface of chemical plating equipment
Application Number: 200610114430 Application Date: 2006.11.10
Publication Number: 1948552 Publication Date: 2007.04.18
Approval Pub. Date: Granted Pub. Date:
International Classifi-cation: C23C18/00;B08B3/08
Applicant(s) Name: Beijing Polytechnic Univ. Address:
Inventor(s) Name: Wang Che;Wang Qun;Guo Hongxia;Li Yongqing;Nie Shid
Attorney & Agent: liuping
Abstract:
    Method to clear plated metal on device surface by chemical plating belongs to the field of surface treatment. The old method evacuates plating liquid and clear device by using concentrated nitric acid. Reaction of concentrated nitric acid and Cu results to thrill toxic gas, which burns operators on skin and pneogaster etc. easily and damages their health directly. Procreant waste and washing liquid needs complex process and high cost to recover, and their discharging pollutes environment. This invention uses plating liquid to immerse chemical plating plated metal device surface. Adding 2-4g/L oxydol, plating liquid is stirred uniformly and heated on chemical plating temperature. After discharging gas and clarifying, the liquid completes clearance of plated metal. The invention is clean without toxic gas. Adjusting PH of used liquid and adding some reducer can renew function of plating liquid. It also can transfer plated metal to metal ion which can be supplied into plating liquid for continuous using. Without washing or discharging waste liquid, the invention has simple craft and low cost.
Time: 20