Title: Dry ice cleaning method for apparatus of coating by vaporization
Application Number: 200610119350 Application Date: 2006.12.08
Publication Number: 1970176 Publication Date: 2007.05.30
Approval Pub. Date: Granted Pub. Date:
International Classifi-cation: B08B7/00;C23C14/56
Applicant(s) Name: Shanghai Matsushita Plasma Display Co., Ltd. Address:
Inventor(s) Name: Sheng Ting
Attorney & Agent: huangzhi da
Abstract:
    The cleaning with solid carbon dioxide for deposition equipment utilizes the temperature tolerance dramatic change of two materials resulted from the residue heat and solid carbon dioxide after heating the deposition under 100-200DEG C temperature, spraying solid carbon dioxide on the equipment surface, crushing the magnesia film left with solid carbon dioxide staying in the gaps between films left, condensing the contamination, and peeling off the residue film from the equipment with extreme inflation of the solid carbon dioxide. It features in the high voltage withstanding ability of 30,000-40,000 watts, without conductivity, with reduced washing cost of 3-5 times.
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