Title: Coating processing device
Application Number: 200610107524 Application Date: 2006.07.20
Publication Number: 1915537 Publication Date: 2007.02.21
Approval Pub. Date: Granted Pub. Date:
International Classifi-cation: B05C5/02;B05B13/02
Applicant(s) Name: Dainippon Screen Manufacturing Co., Ltd. Address:
Inventor(s) Name: Nishioka Kentaro;Takagi Yoshinori;Ikeda Fumihiko
Attorney & Agent: xu shu
Abstract:
    The invention provides an apparatus for applying a treating liquid, in which the treating liquid is prevented from being stuck to the area outside the area to be coated of a substrate while preventing occurrence of a failure owing to foreign matter. A protection member is arranged for removing the foreign matter toward the moving direction of a slit nozzle in a slit coater. When application of the treating liquid is started, the slit nozzle is moved horizontally from the position of the outside just above the substrate to the start poort of the slit nozzle is moved from the position of the outside just above the substrate to the end of the substrate, the discharge port isition where the application of the treating liquid is started. When the discharge port kept at the same reference height as that when the treating liquid is applied (step S11-S13). When the discharge port is moved from the end of the substrate to the start position, the discharge port is kept higher than the reference height (step S14-S16). As a result, the treating liquid can be prevented from being stuck to the area outside the area to be coated of the substrate. Since the lower end of the protection member is constituted of two plates, even when the foreign matter which is not brought into contact with the front plate during the time to keep the discharge port higher is present, the foreign matter can be brought into contact with the back plate.
Time: 12