Title: Solution application device and metering method of supply volume, solution supply method
Application Number: 200610064773 Application Date: 2006.10.20
Publication Number: 1974027 Publication Date: 2007.06.06
Approval Pub. Date: Granted Pub. Date:
International Classifi-cation: B05C5/02;B05C13/02;B05B13/04;B05C11/10;B05B1/28
Applicant(s) Name: Shibaura Mechatronics Corp. Address:
Inventor(s) Name: Kajiwara Shinji;Matsushima Daisuke
Attorney & Agent: huangjian feng
Abstract:
    The invention provides a coating apparatus which can enhance measure precision of the supply quantity of the solution ejected from a nozzle and can improve the measure efficiency. The apparatus supplying the solution to a substrate, comprises: a plurality of coating nozzles 22 aligned to predefined direction for supplying the solution to the substrates, and a hold base 7 of the substrate arranged at the top, and a first linear motor 8 for relatively moving the hold base and the coating nozzles in a direction crossed with the predefined direct, and a balance 41 for measure of the weight of the solution supplied by the coating nozzles, and a second linear motor 44 for moving the balance independent form the hold base in the predefined direction and a direction crossed with that.
Time: 10
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