Title: Chemical vaporization-coating device
Application Number: 200510123337 Application Date: 2005.11.23
Publication Number: 1891855 Publication Date: 2007.01.10
Approval Pub. Date: Granted Pub. Date:
International Classifi-cation: C23C16/00;B05B1/14
Applicant(s) Name: Samsung Electronics Co., Ltd. Address:
Inventor(s) Name: Kul Gwang Joon;Andriy Yushakov;Wu Chengtai;Cheong
Attorney & Agent: guo hongxi li youjia
Abstract:
    The invention relates to a chemical vaporization-coating device (CVD) comprising: a reactor for forming a reaction chamber having a gas flow inlet in top of the reaction chamber to supply reacting gas; a support table within the rection chamber for supporting a working object; a sprinkler with nozzle unit for ejecting the reacting gas on the working object through the gas flow inlet, the nozzle unit consisting of a plurality of nozzle bores arranged with flow length gradually becoming longer along the direction from the center axis to the radial outside. Thereby, The invention provides a chemical vaporization-coating device capable of uniformly forming a vaporization-coating film.
Time: 5
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