| Title: | Vacuum deposition device and method therefor | ||
| Application Number: | 200510101739 | Application Date: | 2005.11.24 |
| Publication Number: | 1970826 | Publication Date: | 2007.05.30 |
| Approval Pub. Date: | Granted Pub. Date: | ||
| International Classifi-cation: | C23C14/24;B05B1/14 | ||
| Applicant(s) Name: | Qunkang Technology (Shenzhen) Co., Ltd. | Address: | |
| Inventor(s) Name: | Huang Ronglong;Peng Jiapeng;Lai Jianting;Yang Qiul | ||
| Attorney & Agent: | |||
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Abstract: |
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| The invention discloses a vacuum depositing device and method, which comprises the following parts: vacuum cavity, injector, gas supplying pipe, diffusing device and working bench, wherein the injector and working bench are set in the vacuum cavity with multiple air holes on the injector; the gas supplying pipe connects air hole; the diffusing device is fixed on the injector. | |||
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| Time: | 8 | ||
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