Title: Gas supply nozzle with improved homogeneity of air current
Application Number: 200510130650 Application Date: 2005.12.16
Publication Number: 1843635 Publication Date: 2006.10.11
Approval Pub. Date: Granted Pub. Date:
International Classifi-cation: B05B1/14,C23F4/00,H01L21/3065
Applicant(s) Name: Beijing North Micro-electronics Base Equipment Pro Address: 100016
Inventor(s) Name:
Attorney & Agent: si junzhi
Abstract:
     The invention relates to an inlet ejector for improving the uniformity of airflow. Wherein, said ejector comprises a central air intake opening and 4-10 air intake openings with certain radiation angles uniformly distributed around the central one. Said invention can improve the distribution uniformity of artificial gas from center to edge of wafer, therefore, the etching speed from center to edge can be uniform. And it can effectively control the etching speed and uniformity with the increase of wafer size.
Time: 8
<- Previous Patent:Liquid-way system for de-icing ve...   |  Next Patent:Pouring container with pump ->