Title: Gap nozzle,substrate processing apparatus and method
Application Number: 200610054724 Application Date: 2006.03.02
Publication Number: 1833779 Publication Date: 2006.09.20
Approval Pub. Date: Granted Pub. Date:
International Classifi-cation: B05B1/04,B05C5/02
Applicant(s) Name: Dainippon Screen Mfg Address:
Inventor(s) Name: Ikeda Fumihiko, Kajino Kazuki, Hosogawa Akihiro
Attorney & Agent: gao longxin wang yushuang
Abstract:
     The invention relates to a method for coating process liquid with stable coating width by narrow nozzle. Wherein, the thickness (d) of lower end (721a) of the side plate (721) of narrow nozzle is under 0.7mm; therefore, even the motion speed of narrow nozzle (42) is slow, or the viscidity of corrosion resisting liquid is lower, the invention can reduce the outward expansion width of coated corrosion resisting liquid 90, to restrain the change of coated width.
Time: 9