Title: Continuous gas saturation system and method
Application Number: 99103021 Application Date: 1999.02.26
Publication Number: 1242248 Publication Date: 2000.01.26
Approval Pub. Date: Granted Pub. Date:
International Classifi-cation: B01B1/00
Applicant(s) Name: L Address:
Inventor(s) Name: Douglas B. Nurmi
Attorney & Agent: wang jie
Abstract:
    The present invention provides a system and method for saturating a gas with a vapor from a liquid chemical. The system includes: (a) a saturation vessel connected to receive a liquid chemical and a carrier gas; (b) a gas sparger in the saturation vessel for sparging the carrier gas into the liquid chemical; (c) means for maintaining the liquid chemical in the saturation vessel at a substantially constant level; (d) means for controlling the temperature of the liquid chemical in the saturation vessel to a desired value, comprising (i) a system for cooling the liquid chemical, and (ii) a heater inside the saturation vessel extending vertically in the liquid a distance at least half of the height of the liquid chemical level for heating the liquid chemical; and (e) means for controlling the pressure of the saturated gas to a desired value. The invention also relates to novel methods and systems for controlled delivery of a vaporized liquid chemical. The invention has particular applicability to the semiconductor manufacturing industry.
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