Title: Soft x-ray processing device and soft x-ray processing method
Application Number: 200580004111 Application Date: 2005.02.09
Publication Number: 1918667 Publication Date: 2007.02.21
Approval Pub. Date: Granted Pub. Date:
International Classifi-cation: G21K1/06;G21K5/02;B23K26/00;H05G2/00
Applicant(s) Name: Japan Science Address:
Inventor(s) Name: Makimura Tetsuya;Murakami Kouichi
Attorney & Agent: xu jing
Abstract:
    Use an ellipsoidal mirror that matches the wavelength of soft X-ray and thereby improves light-focusing efficiency, to increase the energy density of soft X-ray and process and/or refine works made of inorganic materials, etc., at an accuracy of several nm by using only soft X-ray, without irradiation with both patterned soft X-ray (patterned beam) and processing laser light. Focus soft X-ray 14 emitted from a light source part 7 to high energy density using an ellipsoidal mirror 15 and irradiate a work 19 with the focused light in a specified pattern in order to process only the area of the work 19 that has been irradiated with soft X-ray 14 in the specified pattern.
Time: 16
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