| Title: | Apparatus and method for substrate neutralization and glass substrate charging prevention | ||
| Application Number: | 200610054726 | Application Date: | 2006.03.02 |
| Publication Number: | 1835653 | Publication Date: | 2006.09.20 |
| Approval Pub. Date: | Granted Pub. Date: | ||
| International Classifi-cation: | H05F3/06,H05F3/04,H01T19/04,H01T23/00,G02F1/133 | ||
| Applicant(s) Name: | Omron Tateisi Electronics Co. | Address: | |
| Inventor(s) Name: | Hosokawa Yoshinori, Okamoto Shigeo, Masuda Masayuk | ||
| Attorney & Agent: | gao longxin wang yushuang | ||
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Abstract: |
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| A neutralizing method and a neutralizing apparatus for effectively neutralizing an insulating member in a simple and efficient way are disclosed. A hard X-ray generating device radiates a hard X-ray on the obverse surface of the insulating member from the direction perpendicular to the obverse surface of the insulating member. The hard X-ray generating apparatus radiates a hard X-ray having the wavelength of not less than 0.05 AA but less than 1 AA. The hard X-ray ionizes the air on the obverse surface of the insulating member and neutralizes the charge on the obverse surface of the insulating member, while at the same time neutralizing the charge on the reverse surface of the insulating member by the X-ray transmitted through the insulating member. | |||
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| Time: | 11 | ||
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