Title: Stabilized oscillator circuit for plasma density measurement
Application Number: 00810636 Application Date: 2000.07.20
Publication Number: 1361919 Publication Date: 2002.07.31
Approval Pub. Date: 2004.07.07 Granted Pub. Date: 2004.07.07
International Classifi-cation: H01J7/24;H05B31/26
Applicant(s) Name: Tokyo Electron Limited Address:
Inventor(s) Name: Murray.D. Sirkis;Joseph.T. Verdeyen
Attorney & Agent: jiang shixun
Abstract:
    A method and system for controlling electron densities in a plasma processing system (105). By applying a dither voltage (117) and a correction voltage to a voltage-controller oscillator (101), electron density of an open resonator plasma processing system (105) may be measured and controlled as part of a plasma-based process.
Time: 16
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