| Title: | Semiconductor device and method of fabricating the same | ||
| Application Number: | 200610149412 | Application Date: | 2006.11.17 |
| Publication Number: | 1972044 | Publication Date: | 2007.05.30 |
| Approval Pub. Date: | Granted Pub. Date: | ||
| International Classifi-cation: | H01S5/00;H01L33/00;H01L27/12;H01L21/20;H01L21/84 | ||
| Applicant(s) Name: | Samsung Electronics Co., Ltd. | Address: | |
| Inventor(s) Name: | Paek Ho-sun;Sa Kong-tan;Son Joong-kon;Lee Sung-nam | ||
| Attorney & Agent: | taofeng bei | ||
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Abstract: |
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| Provided are semiconductor devices having improved surface morphology characteristics, and a method of fabricating the same. The semiconductor device includes: an r-plane sapphire substrate; an Al | |||
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| Time: | 14 | ||
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