Title: Plasma processing apparatus
Application Number: 200610143929 Application Date: 2006.11.03
Publication Number: 1972552 Publication Date: 2007.05.30
Approval Pub. Date: Granted Pub. Date:
International Classifi-cation: H05H1/46;H01P5/04;H01P1/06;H01L21/00
Applicant(s) Name: Univ Tohoku Address:
Inventor(s) Name: Ohmi Tadahiro;Hirayama Masaki;Horiguchi Takahiro
Attorney & Agent: wangsi beng
Abstract:
    The purpose of the present invention is to provide homogeneous plasma in longitudinal direction of a plasma processing apparatus applicable to multiple processes. A microwave waveguide 10 with a plurality of variable couplers 12 is placed in a vacuum chamber 21 . The microwave generated in a microwave generator 23 is introduced into the microwave waveguide 10 via a waveguide 24 . And a plasma 22 in the chamber 21 is generated by the microwave 25 . Intensity distribution of the microwave 25 in the microwave waveguide 10 can be varied by moving a plurality of variable couplers 12 individually upward or downward as shown by two-way arrow.
Time: 11
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