Title: Ion source and its operating method
Application Number: 01138429 Application Date: 2001.11.09
Publication Number: 1353443 Publication Date: 2002.06.12
Approval Pub. Date: 2006.12.06 Granted Pub. Date: 2006.12.06
International Classifi-cation: H01J27/08;H01J37/08;C23C14/48
Applicant(s) Name: Nisshin Electric Corp. Address:
Inventor(s) Name: Miyamoto Naoki
Attorney & Agent: luo peng
Abstract:
    In an ion source, a rear reflector 10 is electrically insulated from both a plasma production vessel 2 and a filament 6. The rear reflector 10 and an opposed reflector 8 are electrically connected. Further, a DC bias power supply 32 is a power supply individuated from a filament power supply 24 and an arc power supply 26. The DC bias power supply 32 is placed for applying a bias voltage VB between the opposed reflector 8 and the rear reflector 10 and with both the reflectors 8 and 10 as negative potential.
Time: 13