Title: Film with high dielectric constant and low dielectric loss
Application Number: 90102967 Application Date: 1990.10.22
Publication Number: 1050462 Publication Date: 1991.04.03
Approval Pub. Date: Granted Pub. Date: 1993.01.27
International Classifi-cation: H01B3/28,H01B3/30,H01G4/20
Applicant(s) Name: Tongji Univ Address: 200092
Inventor(s) Name: Chen Jiahua
Attorney & Agent: CHEN LONGMEI CHEN SHUDE
Abstract:
     This invention relates to a film of macromolecular polymer polyblend, used for making capacitor and insulating materials. This polyblend is made up of polypropylene and chemigum (nitrile content is 26-35%) by fully mixing in a mixer-refiner. The obtained polyblend can be made into this film meeting various specifications through such steps as breaking, moulding or extruded-calendering, and bidirectional drawing. It features high dielectric constant greater than 4.21, low dielectric loss less than 3 x10 to the power -3, and better processing performance. The capacitor made from this film has a volume decreased by 54%.
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