Title: Full film vacuum capacitor and local dipping capacitor
Application Number: 91109168 Application Date: 1991.09.29
Publication Number: 1060179 Publication Date: 1992.04.08
Approval Pub. Date: Granted Pub. Date:
International Classifi-cation: H01G1/13,H01G4/14,H01G4/22
Applicant(s) Name: Wu Xueshi Address: 100021
Inventor(s) Name:
Attorney & Agent: YANG SIDONG
Abstract:
     The present invention relates to the improvement of solid capacitor. The air gap between plates of the full film vacuum capaciter is less than 10 micrometer and the gap protoctive unit is set up in the container casing. The air gap between plates of local dipping capacitor is less than 1.5 micrometer. The optical film is used as dielectric for all of them. The element is dipped under atmospheric temp and pressure. Compared with the traditional producte, the technical performance of the full film vacuum capactitor is largely improved and the process pertiod of the local dipping capacitor is largely shortened, and the cost is largely lowered.
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