Title: Systems for magnification and distortion correction for imprint lithography processes
Application Number: 200480023067 Application Date: 2004.07.08
Publication Number: 1871103 Publication Date: 2006.11.29
Approval Pub. Date: Granted Pub. Date:
International Classifi-cation: B28B11/08,B28B7/02,A01J25/12,A01J21/00,A21C3/00
Applicant(s) Name: Molecular Imprints Inc. Address:
Inventor(s) Name: Choi Byung Jin, Sreenivasan Sidlgata V.
Attorney & Agent: gu junfeng
Abstract:
     The present invention is directed toward a system to vary dimensions of a template in order to attenuate if not prevent distortions in an underlying pattern formed by the template. To that end, the system features a compression device that includes a pair of spaced-apart contact members to compress a perimeter surface of the template between the pair of spaced-apart contact members. The compression device includes first and second bodies, each has a contact member and an actuator arm. One of the actuator arms is coupled to the first body to reciprocate about an axis in response to variations of a volume of a bladder disposed adjacent to the actuator arm. In this manner, the distance between the two contact members may be varied.
Time: 6