| Title: | Method for integration of resistors in chemically deposited conductor networks | ||
| Application Number: | 86106985 | Application Date: | 1986.09.11 |
| Publication Number: | 1020038 | Publication Date: | 1988.08.03 |
| Approval Pub. Date: | Granted Pub. Date: | ||
| International Classifi-cation: | H01C17/06;H05K3/00 | ||
| Applicant(s) Name: | Schering AG (DE) Postfach 65 03 11, D-1000 Berlin | Address: | |
| Inventor(s) Name: | Detlef Tenbrink;Martin Bock | ||
| Attorney & Agent: | WANG YIPING | ||
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Abstract: |
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| The invention relates to an integration process for high-reliability and small thick-layer resistors in conductor networks which are produced using chemical or electro-chemical processes, characterised in that, on a circuit carrier with a conductor network, after the screen printing process, resistor pastes are printed and burnt in or hardened, or in that a circuit carrier is initially printed with the resistor pattern and the associated contact spots after an adhesion-improving pretreatment, and in that, after the burning in or hardening of the pastes, a fully-additive conductor path construction is carried out by means of selective, chemical metal deposition. | |||
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| Time: | 19 | ||
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