| Title: | Method of producing wafer | ||
| Application Number: | 86107119 | Application Date: | 1986.10.21 |
| Publication Number: | 1010274 | Publication Date: | 1987.04.09 |
| Approval Pub. Date: | Granted Pub. Date: | ||
| International Classifi-cation: | B28D5/00;C30B33/00 | ||
| Applicant(s) Name: | Mitsubishi Kinzoku Kabushiki Kaisha (JP) Tokyo Jap | Address: | |
| Inventor(s) Name: | Yuichi Saitou | ||
| Attorney & Agent: | QI ZENGDU | ||
|
|
|
||
Abstract: |
|||
| There is disclosed a method of providing an elongated stock; producing a wafer comprising the steps of processing one end face of an elongated stock to form a first flat surface; cutting through one end portion of the stock transversely by a cutter to provide a slice of a predetermined thickness having opposite side faces defined respectively by the first flat surface and a cut surface subjected to the cutting; and processing the cut surface of the slice to form a second flat surface, using the first flat surface as a reference surface, thereby providing the wafer. | |||
|
|
|||
| Time: | 5 | ||
<- Previous Patent:Preparation of MgO.LaO.Al2O3.NdO ...
| Next Patent:Production of high-oxygen-content... ->
|
|||