Title: Surface treatment method for titanium matrix metal electrode
Application Number: 94110289 Application Date: 1994.05.31
Publication Number: 1113969 Publication Date: 1995.12.27
Approval Pub. Date: Granted Pub. Date:
International Classifi-cation: C25F3/08
Applicant(s) Name: Dalian Chemistry and Physiscs Inst., Chinese Acade Address: 116012
Inventor(s) Name:
Attorney & Agent: WANG HUIMIN
Abstract:
     The invented method adopts the electrochemical etching principle and puts the haloid element beairng ions Cl-, Br- or I- as etching ions, the concentration is 0.1-3.0 mol/l. It may add the inorganic salts of HCl, HBr, HNO3 or H2SO4 etc. to regulate the acidity of the etching liquid and the soluble salt containing the inorganic acid radicals of NO3-, NO2-, So4 2- or Cl- to heighten the hole etch potential while electrochemical etching and make the density of the etch hole increase and the pore diameter and pore shape be improved, said method is adopted for increasing the binding strength of the surface plating of matrix, the working surface area of the electrode and the sevice life.
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