| Title: | Electrode structure, electrolytic etching process and apparatus using same, and process for producing photo-electricity generating device | ||
| Application Number: | 97125444 | Application Date: | 1997.12.05 |
| Publication Number: | 1191903 | Publication Date: | 1998.09.02 |
| Approval Pub. Date: | 2004.07.14 | Granted Pub. Date: | 2004.07.14 |
| International Classifi-cation: | C25F3/02;C25F7/00 | ||
| Applicant(s) Name: | Canon K. K. | Address: | |
| Inventor(s) Name: | Masaya Hisamatsu;Akio Hasebe;Tsutomu Murakami | ||
| Attorney & Agent: | wang yonggang | ||
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Abstract: |
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| An electrode structure is constituted by a first electrode, and at least one second electrode providing a pair of opposite portions with a prescribed spacing therebetween at which the first electrode is disposed. The electrode structure is suitably used for electrolytic etching and is effective in providing an accurate etching pattern without damaging the surface of an etching object. | |||
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| Time: | 9 | ||
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