Title: Circuitry and method for electroplating plant or etching plant pulse power supply
Application Number: 98801253 Application Date: 1998.02.02
Publication Number: 1237215 Publication Date: 1999.12.01
Approval Pub. Date: 2005.06.01 Granted Pub. Date: 2005.06.01
International Classifi-cation: C25F7/00;C25D5/18
Applicant(s) Name: Atotech Deutschland GmbH Address:
Inventor(s) Name: Manfred Maurer
Attorney & Agent: wang sibeng
Abstract:
    The invention relates to circuitry and a method for supplying electrolytic cells with a pulse current for use in electroplating plants. Two galvano-rectifiers (5,32) and a change-over switch (12) with two respective separate switches (23,24) are included to provide each electrolytic cell with power. One respective rectifier output is connected by a first line (34,35) to the electrolytic cell. The other rectifier outputs are respectively connected to the change-over switch inputs by a second line (34,35). The change-over switch output (18) is joined to the other connection of the electrolytic cell. A capacitor (20,21) is connected between the first and second line. Periodic pulses are produced by alternately opening and closing the separate switches.
Time: 3