Title: No-pollution metal etching method and device thereof
Application Number: 98111618 Application Date: 1998.12.16
Publication Number: 1257138 Publication Date: 2000.06.21
Approval Pub. Date: Granted Pub. Date:
International Classifi-cation: C25F3/14,C25F7/00
Applicant(s) Name: Zhu Liu Address: 214035
Inventor(s) Name: Zhu Liu, Jiang Zhenhua
Attorney & Agent: chen jianhe
Abstract:
     The metal etching method free from acid pollution includes the following steps: applying photoresist on the surface of metal plate to be processed, then drying, light-sensing, developing, electroetching the surface of the metal plate, i. e. using positive electrode to electrically connect with metal to be treated, using another conductor to form negative electrode, and between positive and negative electrodes introducing conductive salt solution to form a running fluid flow. Its equipment includes conductive salt solution tank, D. C. or pulsating D. C. power supply, power supply positive electrode connected with metal to be treated and conductive electrode connected with power supply negative electrode, said power supply negative electrode can be made into the form of a cavity, and is connected with output tube of conductive salt solution pump, and the surface of power supply negative electrode has several liquid output holes of conductive salt solution.
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