Title: High-efficient polishing working method for diamond film
Application Number: 99104906 Application Date: 1999.03.09
Publication Number: 1266111 Publication Date: 2000.09.13
Approval Pub. Date: Granted Pub. Date:
International Classifi-cation: C23C16/26,C23C16/56,C25F3/16
Applicant(s) Name: Guangdong Polytechnic Univ. Address: 510090
Inventor(s) Name: Wang Chengyong, Guo Zhongning
Attorney & Agent: liu hui
Abstract:
     A high-effective polishing processing method of diamond film is characterized by firstly applying a metal coating layer capable of making the diamond film form an electric conductive fim on its surface, and then conducting electric etching processing. Said invention possesses the following advantages: utilizing short time and low cost to obtain high processing accuracy and high processing efficiency, effectively protecting thin crystal boundaryof diamond film from damage due to heat shock, ensuring discharge processing stability, ndurance and quality by means of high-quality rotating electrode electric etching processing and simple processing method and low cost, and easy to implement industrial production.
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