Title: Photosensitive polymer composition and electrophoretic deposition process thereof
Application Number: 86100150 Application Date: 1986.01.11
Publication Number: 1012245 Publication Date: 1987.07.22
Approval Pub. Date: Granted Pub. Date:
International Classifi-cation: C25D13/06,G03C1/71,G03C1/74,G03F7/10
Applicant(s) Name: Rohm and Haas Co. (US) Independence Mall West, Phi Address:
Inventor(s) Name: Mark Robert Winkle
Attorney & Agent: LI YONG
Abstract:
     A kind of photosensitive polymer composition can be deposited onto electroconductive surface to form a uniformly adhering photosensitive film by electrophoretic method. The composition is composed of aqueous solution and emulsion including at least one polymer. It contains charged carrier group, optical sensitizer and unsaturated source being used to make the produced film cross-link during the photochemical radiation exposure. The photosensitive film made of the photosensitive polymer composition can be developed in aqueous solution and has corrosion resistance to strong alkali and strong inorganic acid. It is suitable for the preparation of printed circuit board, planar metallic printing plate, cathod ray tube and chemical grinding, weld resistive agent and planar coating layer.
Time: 7
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