Title: Mechanically assisted photoelectrical technology
Application Number: 87103656 Application Date: 1987.05.22
Publication Number: 1018423 Publication Date: 1988.05.18
Approval Pub. Date: Granted Pub. Date:
International Classifi-cation: C25D1/08
Applicant(s) Name: Yuan Bingliang Address:
Inventor(s) Name:
Attorney & Agent:
Abstract:
     The mechanically assisted photoelectrical technology relates to the electro-vacuum technology. It is a technique for the fabrication of the straight line filament frame, square hole copy negative and electroplating copy screen. The said technology is very simple and suitable for the large-scale production of the square hole target screens in the electronic beam tubes with high quality, high production rate, high efficiency and low material consumption. It can be used to fabricate various molecular sieves and square hole screens used in many instruments. After the fabrication of negatives, various pricision parts with complex and irregular shapes can be made and their strength and thickness can be increased by the pulse and reverse electroplating. It the photosensitive glue is resistant against FH, then the gratings and meshes can be fabricated.
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