Title: Method of eliminating undesirable carbon product deposited on inside of reaction chamber for CVD
Application Number: 88101465 Application Date: 1988.02.24
Publication Number: 1021227 Publication Date: 1988.10.05
Approval Pub. Date: 1993.03.17 Granted Pub. Date: 1993.03.17
International Classifi-cation: C23G5/00
Applicant(s) Name: Semiconductor Energy Laboratory Co., Ltd. Address:
Inventor(s) Name: Shunpei Yamazaki
Attorney & Agent: YANG LIQIN
Abstract:
    The inside of the reaction chamber of a CVD apparatus is cleaned after deposition of a carbon film. When crystalline carbon or diamond-like carbon is formed in the chamber, undesirable carbon deposits form on the inside of the reaction chamber. The sticky carbon deposits are removed in accordance with the invention by etching, making use of oxygen or an oxygen compound gas rather than a fluorine or chlorine compound gas which tends to damage the inside of the reaction chamber.
Time: 7
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