| Title: | Electrophoretic deposition process for photosensitive polymer composition | ||
| Application Number: | 91108683 | Application Date: | 1986.01.11 |
| Publication Number: | 1058431 | Publication Date: | 1992.02.05 |
| Approval Pub. Date: | Granted Pub. Date: | ||
| International Classifi-cation: | C23F1/02,C25D13/04,G03F7/16,H05K3/06 | ||
| Applicant(s) Name: | Rohm and Haas Co. | Address: | |
| Inventor(s) Name: | Mark Robert Winkle | ||
| Attorney & Agent: | LI YONG | ||
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Abstract: |
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| A phtotsensitive polymerized composite is deposited on an electric conducting surface with electrophoresis process to form a photosensitive film adsorbed uniformly. This composite is made of aqueous solution or emulsion containing at least a polymer and contains charged carrier, optical sensitizing agent and unsaturating source for generating film cross-linking on photochemical radiation exposure. Said photosensitive film may be developed in aqueous solution and has high corrosion resistance to strong inorganic acid and alkali. It is suitable to make PCB, plane metallic print plate, cathode ray tube, chemical grinding, weld inhibitor and plane coating. | |||
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| Time: | 5 | ||
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