Title: Permanent-magnetic circuit structure adjustable in large area for dry technology
Application Number: 90109813 Application Date: 1990.12.19
Publication Number: 1052571 Publication Date: 1991.06.26
Approval Pub. Date: Granted Pub. Date: 1993.02.10
International Classifi-cation: B44C1/22,C03C15/00,C23F1/02,H01L21/306
Applicant(s) Name: Microelectronics Centre, Chinese Academy of Scienc Address: 100010
Inventor(s) Name:
Attorney & Agent: YANG PEIZHANG
Abstract:
     This invention discloses a permanent-magnet circuit structure for applying a magnetic field to magnetically controlled etching machine. This permanent-magnet circuit structure is installed in reaction chamber to directly form a magnetic field and consists of a pair of polar plates, including many permanent-magnet units, a soft iron loop and angle iron. By regulation, an uniform magnetic field whose intensity is adjustable is formed in etching area for silicon chip. This invention features simple structure and high accuracy.
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