Title: Plane magnetic controlled sputtering target and its surfacing method
Application Number: 85100096 Application Date: 1985.04.01
Publication Number: 1001666 Publication Date: 1986.07.16
Approval Pub. Date: Granted Pub. Date: 1989.09.27
International Classifi-cation: C23C14/34
Applicant(s) Name: Qinghua Univ. Address:
Inventor(s) Name:
Attorney & Agent: ZHANG SHANYU
Abstract:
     This equipment includes two blocks of electromagnet at least. The target plate consists of several different kinds of materials separately joined together. When the relative proportional of the exciting current of each electromagnet is adjusted, the relative proportional of the magnetic intensity of each part of the surface runway magnetic field on the target plate is changed. So, the compo-sition of the coated alloy membrane can be continuously adjusted in a certain range.
Time: 6
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