Title: Technology for plating titanium on diamond
Application Number: 85102371 Application Date: 1985.04.01
Publication Number: 1003316 Publication Date: 1986.09.17
Approval Pub. Date: Granted Pub. Date:
International Classifi-cation: B23P5/00,C23C14/18,C23C14/26
Applicant(s) Name: Chengdu University of Science and Technology Address:
Inventor(s) Name: Chen Xianmong
Attorney & Agent:
Abstract:
     Titanium film is plated on diamond granules for 5-15 minutes at 1400-1600 deg.C under vacuum of 10 to the power -5 to 10 to the power -6 torr, the plated film is then vacuume-treated for two hours at 800 deg.C. The binding strength of the plated diamond and other metals can be significantly improved, therefore, loss and consumption are reduced.
Time: 6