| Title: | Process for reductive plating on alloy honeycomb substrate | ||
| Application Number: | 85107171 | Application Date: | 1985.09.29 |
| Publication Number: | 1000628 | Publication Date: | 1986.05.10 |
| Approval Pub. Date: | Granted Pub. Date: | ||
| International Classifi-cation: | B01J37/02,C23C18/44 | ||
| Applicant(s) Name: | Xu Jinhang, Bi Tong | Address: | |
| Inventor(s) Name: | Bi Tong | ||
| Attorney & Agent: | LOU GENJI ZHANG HUI | ||
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Abstract: |
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| The process for reductive plating is adopted in the invention. The substrate is pretreated by unoiling, coarsing, thermal activating, etc. The plating solution is composed of plating metal of palladium and platinium (or their soluble salts), PH buffer of ammonium chloride and reductant of hydrogen sulfite of sodium. Comparied with those of classical single replacement plating and the improved couple replacement plating, this process has advantages since it has a fight and homogeneous plating and is of high chemical and thermal steability, good catalytic activity, etc. | |||
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| Time: | 2 | ||
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