Title: Process and apparatus for vaccuum deposition coating
Application Number: 85107585 Application Date: 1985.10.14
Publication Number: 1010820 Publication Date: 1987.05.06
Approval Pub. Date: Granted Pub. Date:
International Classifi-cation: C23C14/56
Applicant(s) Name: Mitsubishi Heavy Industries, Ltd. Address:
Inventor(s) Name: Heisaburo Kokawa, Kanji Waki, Seio Sagari
Attorney & Agent: YAO SHAN
Abstract:
     The invention relates to a process and an apparatus for vacuum deposition coating, including the application of a vacuum deposition coating apparatus. The apparatus has: two vacuum sealing devices and two displacement chambers for inert gas installed in front of and behind the chamber for vacuum deposition coating separately, an atmospheric pressure chamber used for circulating the inert gas from the vacuum chambers of the two vacuum sealing devices to the two displacement chambers and the inert gas circulating and puritying devices used for separating water, oil and oxygen from the inert gas. The features of the said process and apparatus are as follows: the concentrations of oxygen and hydrogen contained in the purified inert gas can be regulated to 60 ppm or less than 0.2~2.0% respectively and the dew point of the inert gas can be adjusted to-50 deg.C or lower.
Time: 6
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