| Title: | Method for monitoring multilayer media membrane with ellipsograph | ||
| Application Number: | 85108747 | Application Date: | 1985.12.02 |
| Publication Number: | 1011625 | Publication Date: | 1987.06.17 |
| Approval Pub. Date: | Granted Pub. Date: | ||
| International Classifi-cation: | C23C14/54 | ||
| Applicant(s) Name: | Beijing Normal Univ. | Address: | |
| Inventor(s) Name: | Shang Shixian | ||
| Attorney & Agent: | LIU SHOUGUO WU SHENGGU | ||
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Abstract: |
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| Said method for monitoring the plating of multilayer optical membrane plated by a vacuum plating device monitored by the oval polarized light gaugemeter characterizes conveniently determining values of parameters phi and delta required in the plating of a certain layer and measuring the real reflection rate and geometric thickness (or optical thickness) of that layer. Said method is suitable for plating of single layer of multilayer membrane, filter and broad flat membrane, one fourth delta membrane or non-one fourth delta membrane. | |||
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| Time: | 6 | ||
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