Title: Cell modification technique with low energy ion beam
Application Number: 93103361 Application Date: 1993.03.26
Publication Number: 1077495 Publication Date: 1993.10.20
Approval Pub. Date: Granted Pub. Date: 2000.11.08
International Classifi-cation: C12M1/42,C12N13/00
Applicant(s) Name: Inst. of Plama Physics, Chinese Academy of Science Address: 230031
Inventor(s) Name: He Jianjun, Wu Yuejin
Attorney & Agent: ZHOU GUOCHENG
Abstract:
     This invented technique uses low-energy ion beam to carry on sputtering etching, external gene introduction, and cell fusion, for animal and plant cells which are placed in micro-environmental target chamber and have been cold-pretreated. This invented device consists of an ions source, a chief vacuum chamber allowing the pass through of ion beam, and a micro-environmental target chamber. The latter is provided with smple stand, pre-evacuating system, highly effective filtering material, and gas current purifying structure which interfaces with gas source. An isolating valve connects the chief vacuum chamber with the micro-environmental target chamber.
Time: 8