Title: Chemical mechanical polishing slurry for metal layers
Application Number: 95196473 Application Date: 1995.09.01
Publication Number: 1166805 Publication Date: 1997.12.03
Approval Pub. Date: 2001.10.31 Granted Pub. Date: 2001.10.31
International Classifi-cation: B24B1/00;C09G1/00
Applicant(s) Name: Cabot Corp. Address:
Inventor(s) Name: Matthew Heville;David J. Fluck;Michael A. Lucarell
Attorney & Agent: WU XIAONAN
Abstract:
    A slurry for use in chemical mechanical polishing of a metal layer comprising high purity fine metal oxide particles uniformly dispersed in a stable aqueous medium.
Time: 5
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