| Title: | Polishing composition | ||
| Application Number: | 97101813 | Application Date: | 1997.01.28 |
| Publication Number: | 1161999 | Publication Date: | 1997.10.15 |
| Approval Pub. Date: | 2001.11.28 | Granted Pub. Date: | 2001.11.28 |
| International Classifi-cation: | C09G1/18 | ||
| Applicant(s) Name: | Fuji Co., Ltd. | Address: | |
| Inventor(s) Name: | Kotama Ichishi;Suzumura Sato;Yokomishi Noritaka | ||
| Attorney & Agent: | LIN YUNHE | ||
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Abstract: |
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| A polishing composition comprising silicon nitride fine powder, water and an acid. | |||
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| Time: | 3 | ||
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