Title: Process for synthesis of phenolic tung oil resin
Application Number: 88101351 Application Date: 1988.03.19
Publication Number: 1030770 Publication Date: 1989.02.01
Approval Pub. Date: Granted Pub. Date: 1993.01.27
International Classifi-cation: C09F7/06
Applicant(s) Name: Beijing Normal Univ. Address:
Inventor(s) Name: Gu Jiangnan, Xu Juhua
Attorney & Agent: MA SIYU
Abstract:
     This invention refers to the synthesis of light-sensitive phenolic tung-oil resin and the technology for making the light-curing material thereof. Tung-oil and resorcinol, in a mole ratio of 1:1-6, are reacted in presence of acid catalyst and a proper amt. of organic solvent at a temp. of 60-140 deg.C to produce tung oil-resorcinol resin. When combining with diazo (polyazo) cpd., the resin will form a series of light-sensitive resin components. The shortcomings of requiring excess phenols on synthesis of phenolic-tung-oil resin in the past and high temp. curing needed for such prod.are thus overcome. It can be widely used in image-formation or microprinting technology, such as used for photoetching adhesive in large scale integrated circuit, dry film anti-corrosion agent for printed circuit board, and as light-sensitive agent, light-sensitive adhesive and light-curing coating etc., for making printing-plates.
Time: 3
<- Previous Patent:Coating drier   |  Next Patent:Modifying process for rosin ->