| Title: | Method for producing nanometer silicon dioxide using datolite | ||
| Application Number: | 02143002 | Application Date: | 2002.09.10 |
| Publication Number: | 1482061 | Publication Date: | 2004.03.17 |
| Approval Pub. Date: | 2006.09.13 | Granted Pub. Date: | 2006.09.13 |
| International Classifi-cation: | C01B33/021,C09C1/28 | ||
| Applicant(s) Name: | Xinyu Iron | Address: | 338001 |
| Inventor(s) Name: | Wu Taibai, Leng Guangrong | ||
| Attorney & Agent: | |||
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Abstract: |
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| The process of producing nano SiO2 with wollastonite as material includes the steps of: adding dispersant, wollastonite powder and hydrochloric acid into chemical reactor with hot water to produce chemical reaction; regulating the pH value of the reacted liquid mixture first with alkali liquid to 4-7 and then with hydrochloric acid to lower than 2; filtering out and tumble-drying the product and transferring the product into one other chemical reactor with hot water; adding hydrochloric acid for secondary reaction; filtering the product silica gel after finishing the reaction; and washing, tumble-drying, soaking in alcohol, tert-butyl alcohol or n-butyl alcohol for protection, stoving and igniting to obtain the product. The present invention features the direct production process from ore to nano SiO2, and has the advantages of simple technological process, short flow path, low power consumption, stable quality and low production cost. | |||
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| Time: | 5 | ||
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