Title: Electronic device comprising a mesoporous silica layer and composition for preparing the mesoporous silica layer
Application Number: 02818135 Application Date: 2002.09.12
Publication Number: 1555342 Publication Date: 2004.12.15
Approval Pub. Date: 2007.05.02 Granted Pub. Date: 2007.05.02
International Classifi-cation: C01B37/02;H01L21/316
Applicant(s) Name: Koninkl Philips Electronics NV Address:
Inventor(s) Name: De Theije Femke K.;Kriege Jan C.;Balkenende Abraha
Attorney & Agent: liu jifu yang jiuchang
Abstract:
    The electronic device with a layer of mesoporous silica can be obtained by applying a composition comprising alkoxysilane, a surfactant and a solvent onto a substrate, and by subsequently removing the surfactant and the solvent. The customary dehydroxylation treatment is not necessary if the composition contains a mixture of tetra-alkoxysilane, particularly teatraethoxyorthosilicate (TEOS), and an alkyl-substituted alkoxysilane, particularly a phenyl-substituted, methyl-substituted or ethyl-substituted trialkoxysilane. If both silanes are present in a molar ratio of approximately 1:1, a layer with a dielectric constant of 2.5 or less is obtained.
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