Title: Method for preparing DDR type zeolite film, DDR type zeolite film, and composite DDR type zeolite film, and method for preparation thereof
Application Number: 02822549 Application Date: 2002.09.17
Publication Number: 1585670 Publication Date: 2005.02.23
Approval Pub. Date: Granted Pub. Date:
International Classifi-cation: B01D71/02,C01B37/02
Applicant(s) Name: NGK Insulators Ltd. Address:
Inventor(s) Name: Nakayama Kunio, Suzuki Kenji, Yoshida Manabu, Yaji
Attorney & Agent: pang lizhi
Abstract:
     A DDR type zeolite film, characterized in that it is formed on a substrate, comprises silica as a main component, and exhibits, with respect to at least two gases selected from the group consisting of carbon dioxide CO2, hydrogen H2, oxygen O2, nitrogen N2, methane CH4, n-butane n-C4H10, isobutane i- C4H10, sulfur hexafluoride SF6, ethane C2H6, ethylene C2H4, propane C3H8, propylene C3H6, carbon monoxide CO and nitrogen monoxide NO, different permeabilities from one another between respective simple gases at room temperature and at 100 DEG C.
Time: 6