Title: Skin state analysis method and device
Application Number: 200610144472 Application Date: 2006.11.08
Publication Number: 1961820 Publication Date: 2007.05.16
Approval Pub. Date: Granted Pub. Date:
International Classifi-cation: A61B5/00;G06Q50/00;G06T1/00
Applicant(s) Name: Shiseido Co., Ltd. Address:
Inventor(s) Name: Masuda Yuji;Kitamura Naoyoshi
Attorney & Agent: duancheng en yangguang jun
Abstract:
    The object of the invention is to process high precision analysis about many aspects of the skin state. The skin state analysis method of the invention uses the given lighting condition to shoot the face of the subject to obtain the image for skin state analysis, including: an analysis step of analyzing at least one of the pore of the skin, the porphyrin of the angle pin and the wrinkle; a storage step of storing the analysis result obtained from the image and the analysis step together with the test data time of the skin of the subject, the subject information; a display image generating step of generating the image of each subject stored for displaying in the storage step and the image of the analysis result; an output step of outputting the information generated in the display image generating step; and to achieve the aim.
Time: 6
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