Title: Attenuating embedded phase shift photomask blanks
Application Number: 97194799 Application Date: 1997.05.09
Publication Number: 1219248 Publication Date: 1999.06.09
Approval Pub. Date: 2004.08.11 Granted Pub. Date: 2004.08.11
International Classifi-cation: G03F1/00
Applicant(s) Name: E. I. Du Pont De Nemours and Co. Address:
Inventor(s) Name: P. F. Carcia;R. H. French
Attorney & Agent: lu xinhua
Abstract:
    Attenuating embedded phase shift photomask blanks capable of producing a phase shift of 180 DEG and having an optical transmissivity of at least 0.001 at selected lithographic wavelengths
Time: 6