| Title: | Photopolymerizable thermosetting resin composition | ||
| Application Number: | 97195922 | Application Date: | 1997.06.17 |
| Publication Number: | 1223727 | Publication Date: | 1999.07.21 |
| Approval Pub. Date: | 2004.12.08 | Granted Pub. Date: | 2004.12.08 |
| International Classifi-cation: | G03F7/00;G03F7/038 | ||
| Applicant(s) Name: | Ciba Specialty Chemicals Holding Inc. | Address: | |
| Inventor(s) Name: | Y. Nojima;T. Ido | ||
| Attorney & Agent: | liu yuanjin | ||
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Abstract: |
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| A photopolymerizable thermosetting resin composition comprising a mixture consisting of (a) an active energy ray-setting resin and obtained by reacting an unsaturated monobasic acid copolymer resin with a cycloaliphatic epoxy group-containing unsaturated compound or reacting a cycloaliphatic epoxy group-containing copolymer resin with an acid group-containing unsaturated compound and (b) a photosensitive prepolymer obtained by esterifying a novolak type epoxy compound with an alpha-beta-unsaturated carboxylic acid and then further reacting with polybasic acid anhydride (and in one embodiment further reacting with an unsaturated isocyanate). | |||
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| Time: | 7 | ||
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